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757-500-G1 | Leybold Inficon Controls & Indicators
- Regular price
- $1,099.00
- Sale price
- $1,099.00
- Regular price
-
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Product Description P/N: 757-500-G1
Description
Technical Specifications
|
Condition |
New/Never Used Surplus |
|
Category |
Controls & Indicators |
|
Subcategory |
Control |
|
Type |
Deposition Controller |
|
Model |
XTC/2 |
|
Voltage |
100-120V |
|
Frequency |
50/60 Hz |
|
Current |
3/8 A |
Information About 757-500-G1
The 757-500-G1 is a specialized deposition controller categorized under Controls & Indicators, specifically designed for applications that require precise control in deposition processes. This device is part of the XTC/2 model series, known for its reliable performance and robust functionality in industrial settings.
Operating within a voltage range of 100-120V, the 757-500-G1 is suitable for various power supply configurations commonly found in industrial environments. Its ability to function at both 50 Hz and 60 Hz makes it versatile and compatible with a wide range of systems, accommodating global power standards and enhancing its usability in different regions.
The controller is designed to handle a current of 3/8 A, which allows it to efficiently manage power distribution while ensuring safety and performance during operation. Its electrical specifications support effective monitoring and control of deposition processes, which are critical in industries such as semiconductor manufacturing, surface coating, and thin-film applications.
As a deposition controller, the 757-500-G1 plays a crucial role in managing the deposition parameters to ensure uniform application and optimal results. This capability is essential in processes where precision is required to maintain quality and consistency of the deposited materials. The controller can interface with various deposition equipment, providing users with the flexibility to integrate it into existing systems seamlessly.
In terms of user interaction, the device typically features indicators and controls that allow operators to monitor the deposition process in real time. This facilitates prompt adjustments to the operational parameters, contributing to enhanced process control and improved efficiency.
Description
Technical Specifications
|
Condition |
New/Never Used Surplus |
|
Category |
Controls & Indicators |
|
Subcategory |
Control |
|
Type |
Deposition Controller |
|
Model |
XTC/2 |
|
Voltage |
100-120V |
|
Frequency |
50/60 Hz |
|
Current |
3/8 A |
Information About 757-500-G1
The 757-500-G1 is a specialized deposition controller categorized under Controls & Indicators, specifically designed for applications that require precise control in deposition processes. This device is part of the XTC/2 model series, known for its reliable performance and robust functionality in industrial settings.
Operating within a voltage range of 100-120V, the 757-500-G1 is suitable for various power supply configurations commonly found in industrial environments. Its ability to function at both 50 Hz and 60 Hz makes it versatile and compatible with a wide range of systems, accommodating global power standards and enhancing its usability in different regions.
The controller is designed to handle a current of 3/8 A, which allows it to efficiently manage power distribution while ensuring safety and performance during operation. Its electrical specifications support effective monitoring and control of deposition processes, which are critical in industries such as semiconductor manufacturing, surface coating, and thin-film applications.
As a deposition controller, the 757-500-G1 plays a crucial role in managing the deposition parameters to ensure uniform application and optimal results. This capability is essential in processes where precision is required to maintain quality and consistency of the deposited materials. The controller can interface with various deposition equipment, providing users with the flexibility to integrate it into existing systems seamlessly.
In terms of user interaction, the device typically features indicators and controls that allow operators to monitor the deposition process in real time. This facilitates prompt adjustments to the operational parameters, contributing to enhanced process control and improved efficiency.
