.svg?v=180920048278408794651792026160){kind=small}
Edwards STP-XA3203C Magnetically Levitated Turbomolecular Vacuum Pump for Semiconductor Processing
- Regular price
- $20,999.00
- Sale price
- $20,999.00
- Regular price
-
Couldn't load pickup availability
Product Description P/N: STP-XA3203C
Description
The Edwards STP-XA3203C is a magnetically levitated turbomolecular vacuum pump designed for semiconductor processing and high-vacuum applications. It provides pumping speeds of 3,200 L/s for nitrogen and 2,300 L/s for hydrogen, supporting processes that require substantial gas throughput.
Technical Specifications
| Condition | New/Never Used Surplus |
| Brand | Edwards |
| Category | Vacuum Equipment |
| Part Number | STP-XA3203C |
| Subcategory | Turbomolecular Vacuum Pumps |
| Series | STP-XA |
| Bearing System | Five-axis magnetic suspension |
| Inlet Flange | ISO320F |
| Pumping Speed | Nitrogen: 3,200 L/s; hydrogen: 2,300 L/s |
| Compression Ratio | Nitrogen: >10⁸; hydrogen: >6 × 10³ |
| Ultimate Pressure | 1 × 10⁻⁷ Pa order, after bakeout |
| Maximum Allowable Backing Pressure | 266 Pa |
| Maximum Gas Flow, Water Cooled | Nitrogen: 2,300 sccm; argon: 1,900 sccm |
| Rated Rotational Speed | 27,500 rpm |
| Starting Time | Approximately 8 minutes; controller dependent |
| Mounting Position | Any orientation |
| Cooling Water Requirements | Flow: 3 L/min; temperature: 5–25 °C; pressure: 0.3 MPa |
| Recommended Purge Gas Flow | 50 sccm |
| Input Voltage | 200–240 V AC, ±10% |
| Power Consumption | 1.5 kVA |
| Weight | 80 kg (176 lb) |
Information About STP-XA3203C
The STP-XA3203C is part of the Edwards STP-XA series of process turbomolecular pumps. Its five-axis magnetic suspension system supports the rotor during operation. The pump platform incorporates thermal management features intended to reduce corrosion and process deposition. Applications include plasma etching, film deposition, sputtering, and ion implantation, with the specified ISO320F inlet providing the vacuum chamber connection.
Key Features:
- Magnetic Rotor Suspension: Uses a five-axis magnetic bearing system to support the rotor during operation.
- High Pumping Speed: Provides 3,200 L/s nitrogen and 2,300 L/s hydrogen pumping capacity.
- Gas Compression: Offers compression ratios greater than 10⁸ for nitrogen and greater than 6 × 10³ for hydrogen.
- Process Gas Throughput: Handles up to 2,300 sccm nitrogen or 1,900 sccm argon under specified water-cooled conditions.
- Thermal Management: Incorporates design features that help reduce process deposition and corrosion.
- Water Cooling: Uses a cooling-water supply to manage heat during operation.
- Flexible Installation: Supports mounting in any orientation according to installation requirements.
- ISO320F Inlet: Connects to compatible chamber flanges and vacuum hardware.
The STP-XA3203C delivers the reliability and precision required for high-vacuum generation and process gas evacuation in semiconductor manufacturing systems.
Description
The Edwards STP-XA3203C is a magnetically levitated turbomolecular vacuum pump designed for semiconductor processing and high-vacuum applications. It provides pumping speeds of 3,200 L/s for nitrogen and 2,300 L/s for hydrogen, supporting processes that require substantial gas throughput.
Technical Specifications
| Condition | New/Never Used Surplus |
| Brand | Edwards |
| Category | Vacuum Equipment |
| Part Number | STP-XA3203C |
| Subcategory | Turbomolecular Vacuum Pumps |
| Series | STP-XA |
| Bearing System | Five-axis magnetic suspension |
| Inlet Flange | ISO320F |
| Pumping Speed | Nitrogen: 3,200 L/s; hydrogen: 2,300 L/s |
| Compression Ratio | Nitrogen: >10⁸; hydrogen: >6 × 10³ |
| Ultimate Pressure | 1 × 10⁻⁷ Pa order, after bakeout |
| Maximum Allowable Backing Pressure | 266 Pa |
| Maximum Gas Flow, Water Cooled | Nitrogen: 2,300 sccm; argon: 1,900 sccm |
| Rated Rotational Speed | 27,500 rpm |
| Starting Time | Approximately 8 minutes; controller dependent |
| Mounting Position | Any orientation |
| Cooling Water Requirements | Flow: 3 L/min; temperature: 5–25 °C; pressure: 0.3 MPa |
| Recommended Purge Gas Flow | 50 sccm |
| Input Voltage | 200–240 V AC, ±10% |
| Power Consumption | 1.5 kVA |
| Weight | 80 kg (176 lb) |
Information About STP-XA3203C
The STP-XA3203C is part of the Edwards STP-XA series of process turbomolecular pumps. Its five-axis magnetic suspension system supports the rotor during operation. The pump platform incorporates thermal management features intended to reduce corrosion and process deposition. Applications include plasma etching, film deposition, sputtering, and ion implantation, with the specified ISO320F inlet providing the vacuum chamber connection.
Key Features:
- Magnetic Rotor Suspension: Uses a five-axis magnetic bearing system to support the rotor during operation.
- High Pumping Speed: Provides 3,200 L/s nitrogen and 2,300 L/s hydrogen pumping capacity.
- Gas Compression: Offers compression ratios greater than 10⁸ for nitrogen and greater than 6 × 10³ for hydrogen.
- Process Gas Throughput: Handles up to 2,300 sccm nitrogen or 1,900 sccm argon under specified water-cooled conditions.
- Thermal Management: Incorporates design features that help reduce process deposition and corrosion.
- Water Cooling: Uses a cooling-water supply to manage heat during operation.
- Flexible Installation: Supports mounting in any orientation according to installation requirements.
- ISO320F Inlet: Connects to compatible chamber flanges and vacuum hardware.
The STP-XA3203C delivers the reliability and precision required for high-vacuum generation and process gas evacuation in semiconductor manufacturing systems.
